19-07-2012, 12:54 PM
Centre for Nanotechnology Initiative
NanoTech_Rev_10May08_1.pdf (Size: 4.49 MB / Downloads: 132)
Abstract
In order to derive concrete product prototypes using nanosceince and technology, a
unique project, funded by nanotechnology initiative of DST, has been initiated at a
current total outlay of 11.5 crores from January 2007. The project focus is currently in
the inter-related areas of : Development of Printable Organic Electronics with Organic-
RFID tags as the first demonstrator prototype, and the Development of a versatile
focused ion beam tool based on microwave plasma ion beam for applications in
patterning and templating of soft-materials and substrates. As a part of this project world
class facilities for printing circuits with technologies such as ink-jet, nano-stamping and
gravure printing methods will be installed.
Development of Printable Organic Electronics
There have been significant progress in design and fabrication of ‘Organic Thin Film
Transistors’ with different architectures. Both top gate and bottom gate TFTs have been
fabricated and tested using existing facilities. Composite and multilayered dielectrics
have been employed in the fabrication of Organic Thin Film Transistors. The channel
current measured in these devices is very encouraging and demonstrate their potential
use in organic electronic circuits. Work is also under progress to design nanoscale
organic thin film transistors using focused ion beam to carve out nanoelectrodes. The
ability to manipulate and make electrical measurements at a nanoscale is also an
integral part. There have been under this project significant progress in the design and
fabrication of ‘Organic Thin Film Transistors’ with different architectures.. Simulational
tools needed for design of components and circuits have been developed. Substrate
development, substrate-ink interaction and screen-printing have been carried out in the
first year of the project
Development of Multi Element Focused Ion Beam (ME-FIB)
This part of the proposal is aimed at developing a Focused Ion Beam system
based on a compact microwave driven plasma ion source, which would provide ion
beams of different elements such as Ar, Kr, H2, N2, B etc. The main objective of this
development work is to provide focused ion beams of a variety of elements, which is
currently limited only to Galium as in liquid metal based ion sources. A multi element FIB
would greatly increase the functionality and open flood gates of application. This
research activity is not only first of its kind in India but also in the world. The first attempt
would be to deliver ion beams of inert gases. Such systems have not been developed
yet and are not commercially available. There are a few efforts world wide in this area
which are based upon RF plasmas, and are primarily in the United States. There has
been significant progress in the design and fabrication of ion beams using microwave.
Vision & Mission
The national initiative on Nano-Science and Technology has funded an unique
interdisciplinary proposal to setup a “Centre for Nanotechnology” at IIT Kanpur, where
focused development of technologies based on the rapidly developing nanosceince can
be developed. At IIT Kanpur, the Project has been formulated to carry out, in its first
phase, technology development in the following three inter-related areas: