19-05-2014, 04:05 PM
Study the characteristics of 65nm STRAINED SILICON PMOS transistor incorporating the SILVACO TCAD TOOLS
INTRODUCTION
The semiconductor industry is one of the world’s largest grossing market sectors, with an annual turnover of hundreds of billions of dollars.
The reason behind this revolution is “MOORE’S LAW”.
CONCLUSION
65-nm PMOS transistor is designed for high speed and low power consumption.
Strained silicon is helpful for the continuation of MOORE’S LAW in nanotechnology era.
Performance enhancement by channel strained silicon in PMOS Technology.