12-05-2011, 11:37 AM
[attachment=13630]
[attachment=13629]
NANO-Lithography
Outline
Roadmap for Lithography
Photolithography
State of art Lithography
Lithography Road Map
Liquid immersion lithography
Improvement of immersion lithography
Immersion lithography system
Immersion lithography system
Immersion lithography Defects
Issues with Immersion Lithography
Very big lenses (hence expensive) !!
Field size reduction ?
Mechanical issues and hydrodynamics
Bubble formation disturbing the image
Stage vibrations transferred to lens
Heating of immersion liquid upon exposure
New defect mechanisms at wafer level
Interaction of photo resist with immersion liquid
Fluid contamination
Polarization effects degrading contrast
EXTREME ULTRAVIOLET (EUV) Lithography
(EUV) Lithography
(EUV) Lithography Issues
Step-and-Flash IMPRINT Lithography (SFIL)
Two-Photon 3D Lithography 双光子三维微细加工
NANO-fabrication with BLOCK COPOLYMERS
[attachment=13629]
NANO-Lithography
Outline
Roadmap for Lithography
Photolithography
State of art Lithography
Lithography Road Map
Liquid immersion lithography
Improvement of immersion lithography
Immersion lithography system
Immersion lithography system
Immersion lithography Defects
Issues with Immersion Lithography
Very big lenses (hence expensive) !!
Field size reduction ?
Mechanical issues and hydrodynamics
Bubble formation disturbing the image
Stage vibrations transferred to lens
Heating of immersion liquid upon exposure
New defect mechanisms at wafer level
Interaction of photo resist with immersion liquid
Fluid contamination
Polarization effects degrading contrast
EXTREME ULTRAVIOLET (EUV) Lithography
(EUV) Lithography
(EUV) Lithography Issues
Step-and-Flash IMPRINT Lithography (SFIL)
Two-Photon 3D Lithography 双光子三维微细加工
NANO-fabrication with BLOCK COPOLYMERS