30-03-2012, 03:30 PM
Solid Ground Curing
[attachment=19281]
Solid Ground Curing (SGC)
•Devleopedby CubitalLtd. of Israel
•High capital and operational cost
•Large heavy equipment
•Good dimensional accuaracy
Instead of using a laser to expose and harden photopolymer element by element within a layer as is done in stereolithography, SGC uses a mask to expose the entire object layer at once with a burst of intense UV light. The method of generating the masks is based on electrophotography(xerography). This is a two cycle process having a mask generation cycle and alayer fabrication cycle. It takes about 2 minutes to complete all operations to make a layer:
1. First the object under construction (A) is given a coating ofphotopolymer resin as it passes the resin applicator station (B) on its way to the exposure cell ©.
2. A mask is generated by electrostaticallytransferring toner in the required object cross sectional image pattern to a glass plate (D) An electron gun writes a charge pattern on the plate which is developed with toner. The glass plate then moves to the exposure cell where it is positioned above the object under construction.
3. A shutter is opened allowing the exposure light to pass through the mask and quickly cure the photopolymer layer in the required pattern. Because the light is so intense the layer is fully cured and no secondary curing operation is necessary as is the case with stereolithography.
[attachment=19281]
Solid Ground Curing (SGC)
•Devleopedby CubitalLtd. of Israel
•High capital and operational cost
•Large heavy equipment
•Good dimensional accuaracy
Instead of using a laser to expose and harden photopolymer element by element within a layer as is done in stereolithography, SGC uses a mask to expose the entire object layer at once with a burst of intense UV light. The method of generating the masks is based on electrophotography(xerography). This is a two cycle process having a mask generation cycle and alayer fabrication cycle. It takes about 2 minutes to complete all operations to make a layer:
1. First the object under construction (A) is given a coating ofphotopolymer resin as it passes the resin applicator station (B) on its way to the exposure cell ©.
2. A mask is generated by electrostaticallytransferring toner in the required object cross sectional image pattern to a glass plate (D) An electron gun writes a charge pattern on the plate which is developed with toner. The glass plate then moves to the exposure cell where it is positioned above the object under construction.
3. A shutter is opened allowing the exposure light to pass through the mask and quickly cure the photopolymer layer in the required pattern. Because the light is so intense the layer is fully cured and no secondary curing operation is necessary as is the case with stereolithography.