23-06-2012, 11:25 AM
Integrated Vacuum Microelectronics
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INTRODUCTION
The practice of using controlled electron propagation in a vacuum to achieve signal gain has been around since the patenting of the triode vacuum tube in 1907 [1]. Although vacuum electronics enabled early radio, television, and computing, they have disappeared in all but a few specialty applications such as high-power RF transmission and certain military systems. Integrated solid-state devices have taken over as a versatile, cheap, and robust alternative to vacuum electronics. This paper examines the potential for a new generation of vacuum electronics. Similar to modern solid-state systems, these devices would be integrated and micro-scale in nature. It will be shown that there are definite advantages to vacuum electronics in certain solid-state dominated applications, as well as sizable challenges that must be surmounted before the technology is successful. The fabrication of these devices will be explored, and the achievable device performance will be evaluated. Finally, future work to advance the field will be proposed based on the findings of the paper.
STATEMENT OF PROBLEM
The transistor was a Nobel-prize winning discovery that redefined the system of use of active devices in electronics and enabled systems that were previously impossible to realize. The state-of-the-art in solid-state electronics allows high frequency operation, low power consumption, low cost, and high fabrication yield. However, there are certain applications where solid-state devices are impractical or inconvenient, and one potential solution is the same vacuum technology that was abandoned nearly 50 years ago.
STATE OF THE ART
To date, there has been substantial work in the field of integrated vacuum electronics. Even after vacuum electronics witnessed their end in popularity in consumer goods, researchers tried to build ever-smaller vacuum devices for the applications mentioned above. With the advent of reliable thin-film and bulk microfabrication, new opportunities emerged for vacuum electronics researchers.
CRITICAL REVIEW OF CURRENT WORK
In order to plan future research directions to meet the aforementioned applications of integrated vacuum electronics, it is important to review current techniques and identify relevant features and shortcomings. This section critiques the state-of-the-art in integrated vacuum microelectronics, and the final section proposes future work on the subject.
[attachment=25189]
INTRODUCTION
The practice of using controlled electron propagation in a vacuum to achieve signal gain has been around since the patenting of the triode vacuum tube in 1907 [1]. Although vacuum electronics enabled early radio, television, and computing, they have disappeared in all but a few specialty applications such as high-power RF transmission and certain military systems. Integrated solid-state devices have taken over as a versatile, cheap, and robust alternative to vacuum electronics. This paper examines the potential for a new generation of vacuum electronics. Similar to modern solid-state systems, these devices would be integrated and micro-scale in nature. It will be shown that there are definite advantages to vacuum electronics in certain solid-state dominated applications, as well as sizable challenges that must be surmounted before the technology is successful. The fabrication of these devices will be explored, and the achievable device performance will be evaluated. Finally, future work to advance the field will be proposed based on the findings of the paper.
STATEMENT OF PROBLEM
The transistor was a Nobel-prize winning discovery that redefined the system of use of active devices in electronics and enabled systems that were previously impossible to realize. The state-of-the-art in solid-state electronics allows high frequency operation, low power consumption, low cost, and high fabrication yield. However, there are certain applications where solid-state devices are impractical or inconvenient, and one potential solution is the same vacuum technology that was abandoned nearly 50 years ago.
STATE OF THE ART
To date, there has been substantial work in the field of integrated vacuum electronics. Even after vacuum electronics witnessed their end in popularity in consumer goods, researchers tried to build ever-smaller vacuum devices for the applications mentioned above. With the advent of reliable thin-film and bulk microfabrication, new opportunities emerged for vacuum electronics researchers.
CRITICAL REVIEW OF CURRENT WORK
In order to plan future research directions to meet the aforementioned applications of integrated vacuum electronics, it is important to review current techniques and identify relevant features and shortcomings. This section critiques the state-of-the-art in integrated vacuum microelectronics, and the final section proposes future work on the subject.