22-03-2012, 11:36 AM
Micro-electro Mechanical Systems (MEMS)
1.ppt (Size: 5.5 MB / Downloads: 97)
ABSTRACT
Micro-Electro Mechanical or microelectronic and micro-electro mechanical systems is the technology of very small mechanical devices driven by electricity; it merges at the nano-scale into nanoelectromechanical systems (NEMS) and nanotechnology. MEMS are also referred to as micromachines (in Japan), or Micro Systems Technology - MST (in Europe).
MEMS are separate and distinct from the hypothetical vision of molecular nanotechnology or molecular electronics. MEMS are made up of components between 1 to 100 micrometres in size (i.e. 0.001 to 0.1 mm) and MEMS devices generally range in size from 20 micrometres (20 millionths of a metre) to a millimetre. They usually consist of a central unit that processes data, the microprocessor and several components that interact with the outside such as microsensor. At these size scales, the standard constructs of classical physics are not always useful. Because of the large surface area to volume ratio of MEMS, surface effects such as electrostatics and wetting dominate volume effects such as inertia or thermal mass.
INTRODUCTION
MEMS is an emerging technology which uses the tools and techniques that were developed for the Integrated Circuit industry to build microscopic machines. These machines are built on standard silicon wafers
MEMS technology is based on a number of tools & methodologies which are used to form small structures with dimension in micrometer scale.
MEMS are made up of components between 1 to 100 micrometers in size (i.e. 0.001 to 0.1 mm) and MEMS devices generally range in size from 20 micrometers (20 millionths of a meter) to a millimeter
Patterning:
Patterning in MEMS is the transfer of a pattern into a material.
1. Lithography:
Lithography in MEMS context is typically the transfer of a pattern into a photosensitive material by selective exposure to a radiation source such as light. A photosensitive material is a material that experiences a change in its physical properties when exposed to a radiation source. If a photosensitive material is selectively exposed to radiation (e.g. by masking some of the radiation) the pattern of the radiation on the material is transferred to the material exposed, as the properties of the exposed and unexposed regions differ.
2.Photolithography:
KrF ArF Immersion EUV
Electron beam lithography
Ion beam lithography
X-ray lithography
1.ppt (Size: 5.5 MB / Downloads: 97)
ABSTRACT
Micro-Electro Mechanical or microelectronic and micro-electro mechanical systems is the technology of very small mechanical devices driven by electricity; it merges at the nano-scale into nanoelectromechanical systems (NEMS) and nanotechnology. MEMS are also referred to as micromachines (in Japan), or Micro Systems Technology - MST (in Europe).
MEMS are separate and distinct from the hypothetical vision of molecular nanotechnology or molecular electronics. MEMS are made up of components between 1 to 100 micrometres in size (i.e. 0.001 to 0.1 mm) and MEMS devices generally range in size from 20 micrometres (20 millionths of a metre) to a millimetre. They usually consist of a central unit that processes data, the microprocessor and several components that interact with the outside such as microsensor. At these size scales, the standard constructs of classical physics are not always useful. Because of the large surface area to volume ratio of MEMS, surface effects such as electrostatics and wetting dominate volume effects such as inertia or thermal mass.
INTRODUCTION
MEMS is an emerging technology which uses the tools and techniques that were developed for the Integrated Circuit industry to build microscopic machines. These machines are built on standard silicon wafers
MEMS technology is based on a number of tools & methodologies which are used to form small structures with dimension in micrometer scale.
MEMS are made up of components between 1 to 100 micrometers in size (i.e. 0.001 to 0.1 mm) and MEMS devices generally range in size from 20 micrometers (20 millionths of a meter) to a millimeter
Patterning:
Patterning in MEMS is the transfer of a pattern into a material.
1. Lithography:
Lithography in MEMS context is typically the transfer of a pattern into a photosensitive material by selective exposure to a radiation source such as light. A photosensitive material is a material that experiences a change in its physical properties when exposed to a radiation source. If a photosensitive material is selectively exposed to radiation (e.g. by masking some of the radiation) the pattern of the radiation on the material is transferred to the material exposed, as the properties of the exposed and unexposed regions differ.
2.Photolithography:
KrF ArF Immersion EUV
Electron beam lithography
Ion beam lithography
X-ray lithography